Transparent ferrimagnetic semiconducting CuCr2O4 thin films by atomic layer deposition
American Institute of Physics (AIP)
We report the magnetic and optical properties of CuCr 2 O 4 thin films fabricated by atomic layer deposition (ALD) from Cu(thd) 2 , Cr(acac) 3 , and ozone; we deposit 200 nm thick films and anneal them at 700 °C in oxygen atmosphere to crystallize the spinel phase. A ferrimagnetic transition at 140 K and a direct bandgap of 1.36 eV are determined for the films from magnetic and UV-vis spectrophotometric measurements. Electrical transport measurements confirm the p-type semiconducting behavior of the films. As the ALD technique allows the deposition of conformal pin-hole-free coatings on complex 3D surfaces, our CuCr 2 O 4 films are interesting material candidates for various frontier applications.
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics